Abstract for Traces between phase array antenna and radio frequency integrated circuit in the mm-wave system

The disclosed systems and methods to reduce distortion in an image displayed on a near-eye display. The invention covers a display system comprising an assembly for light that generates the light needed to display images and a distortion-correcting optical assembly. Mirror scanning systems are designed to take the light that has been distorted, then reflect it, and then scan it to produce images on an image plane. The distortion-correcting optics unit delivers the pre-distorted and collimated light into the mirror scanning system, which is configured to deform the light and send an image that is undistorted to a display.

Background for Traces between phase array antenna and radio frequency integrated circuit in the mm-wave system

The disclosure described herein generally refers to optical projection systems, in particular one that has the capability of displaying a scan.

Headsets used in artificial real-time (AR) applications usually display content using the use of a display. For many applications, it is recommended to have a lightweight headset with a slim shape. It is difficult to design a display for this type of headset. The projection system produces image light. However, the combination of space constraints (e.g. extremely small) and a wide field of view (e.g., wide to provide an immersive AR experience) and an external stop-location tend to limit optical designs for projectors and have limited conventional headset design. Design issues can also occur when trying to create projection systems that have a smaller size, like optical and differential distortion.

Summary for Traces between phase array antenna and radio frequency integrated circuit in the mm-wave system

The display described herein is a system that comprises: (i) a light assembly that is configured to produce source light to create a display image; (ii) an optical distortion correction optics assembly that comprises: (a) an anamorphic field lens configured to apply a first distortion to the source light as well as (b) an optical device that includes at least one aspheric anamorphic surface that is configured to apply an additional distortion to the light source from the anamorphic field lens, the second distortion comprising collimation; and(iii) an optical system for scanning configured to divert the light source having the first distortion and second distortion to the distortion correcting optics assembly with the first distortion and the second distortion at least partially compensate for optical distortion due to the scanning system. In certain examples, the light assembly comprises one or more light sources. In some embodiments, one or more light sources create the display pixels. In some embodiments, one or more display pixels are images. In certain embodiments, the source light having the first distortion as well as the second distortion is a collimated and pre-distorted source light.

An anamorphic lens can be configured to adjust the orientation of the source lighting or expand the source lamp or collimate the source. The anamorphic lens can be configured to apply an axisymmetric adjustment to the source light in specific embodiments. In some instances, the optics assembly comprises a monolithic prism. In some instances, the optics assembly includes an open prism with one or more light transmission surfaces and one or more light reflection surfaces. The freeform prism may be configured to distort or collimate the light source in specific embodiments. In certain embodiments, one or more light transmission surface includes a freeform surface. In certain embodiments, one or more light transmission surface comprises a Zernike surface or an aspheric anamorphic surface, or a flat surface. an un-rotationally symmetrical surface, or a non-axisymmetric surface. Certain embodiments contain the following: a Zernike or Anamorphic Aspheric, a flat, non-rotationally symmetric, or non-axisymmetric reflective surface. In some embodiments, the scanning system includes a mirror scanning device. In some instances, the mirror scanning system is designed to undistort the pre-distorted and collimated source light outputted by the distortion-correcting optics assembly.

In some embodiments, the distortion-correcting optics assembly as well as the scanning system are configured to send undistorted light to an image plane. The image plane could comprise at least one of the following options: a coupler or a waveguide or image plane, a coupler or waveguide, a display near-eye display, and a user. In some embodiments, an undisturbed image light is an image light devoid of at least a barrel distortion, a pincushion distortion, a mustache distortion, a keystone distortion, or the differential distortion. In certain embodiments, at a minimum, the distortion of the barrel the pincushion distortion the mustache distortion, the keystone distortion or the differential distortion is pixel misalignment on an image plane. In certain embodiments, the distortion-correcting optics assembly ensures an image plane that is aligned with the pixel plane.

This summary does not identify the key features or essential aspects of the claimed subject material. It is also not intended to be used as a sole source to determine the claim’s scope. The subject matter should be understood by reference to appropriate sections of the full specification of this disclosure, including any or all drawings, and every claim. The foregoing, together with other features and examples, will be described in more detail below in the following specification, claims, and accompanying drawings.

Click here to view the patent on the USPTO website.

How to Search for Patents

A patent search is the very first step towards obtaining your patent. You can do a google patent search or do a USPTO search. After the patent application has been submitted, the product that is covered by the patent application could be described as patent-pending. you can find the patent application online on the public pair. When the patent office is satisfied with your application, you’ll be able to conduct a patent number look to find the patent issued. Your product now has the potential to be patentable. You can also use the USPTO search engine. Read on for details. A patent lawyer or patent attorney can assist you with the process. Patents in the United States are granted by the US trademark and patent office, or the United States patent office and trademark office. The office also examines trademark applications.

Are you interested in similar patents? Here are the steps to follow:

1. Think of terms to describe your invention, based on its purpose, composition, and usage.

Write down a concise detailed description of your invention. Avoid using generic terms like “device”, “process,” or “system”. Instead, look for synonyms for the terms you chose initially. Then, take note of important technical terms and keywords.

Utilize the following questions to help you identify keywords or concepts.

  • What’s the purpose of the invention? Is it a utilitarian device or an ornamental design?
  • Is invention a way to create something or perform some function? Or is it a thing or procedure?
  • What is the basis of the invention? What is the physical structure of the invention?
  • What is the goal of this invention?
  • What are the technical terms and keywords that describe the nature of an invention? A technical dictionary can assist you to locate the right words.

2. These terms will allow you to search for pertinent Cooperative Patent Classifications at Classification Search Tool. If you’re unable to find the right classification to describe your invention, look through the classification’s Schemas of classes (class schedules). If you don’t get any results using the Classification Text Search, you might want to think about substituting the words that describe your invention using synonyms.

3. Review 3. Go over the CPC Classification Definition to verify the accuracy of the CPC classification that you have found. If the classification you have selected includes a blue square with the letter “D” on its left, the hyperlink will take you to the CPC classification definition. CPC classification definitions can help identify the specific classification’s scope, so you are certain to pick the most pertinent. The definitions could also contain search tips or other suggestions that could be helpful for further study.

4. Retrieve patent documents with the CPC classification from the Patents Full-Text and Image Database. By focusing on abstracts and illustrations, you can narrow down your search for most pertinent patent publications.

5. Utilize this selection of the most relevant patent publications to look at each one in-depth for any similarity to your own invention. Pay close attention to the specifications and claims. You may find additional patents by consulting the patent examiner as well as the applicant.

6. You can find patent applications published in the public domain that fit the CPC classification that you chose in Step 3. It is also possible to use the same method of search that you used in step 4 to limit your search results to the most relevant patent applications by reviewing the abstracts and drawings for every page. The next step is to review the patent applications that have been published carefully, paying special attention to the claims and other drawings.

7. Locate additional US patent publications using keyword searching in PatFT or AppFT databases, classification search of non-U.S. patents as described below, and searching for non-patent literature disclosures of inventions using internet search engines. For example:

  • Add keywords to your search. Keyword searches may turn up documents that are not well-categorized or have missed classifications during Step 2. For example, US patent examiners often supplement their classification searches with keyword searches. Think about the use of technical engineering terminology rather than everyday words.
  • Search for foreign patents using the CPC classification. Then, re-run the search using international patent office search engines such as Espacenet, the European Patent Office’s worldwide patent publication database of over 130 million patent publications. Other national databases include:
  • Search non-patent literature. Inventions can be made public in many non-patent publications. It is recommended that you search journals, books, websites, technical catalogs, conference proceedings, and other print and electronic publications.

To review your search, you can hire a registered patent attorney to assist. A preliminary search will help one better prepare to talk about their invention and other related inventions with a professional patent attorney. In addition, the attorney will not spend too much time or money on patenting basics.

Download patent guide file – Click here